24 July 2002 The challenge of nanometrology
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Proceedings Volume 4608, Nanostructure Science, Metrology, and Technology; (2002) https://doi.org/10.1117/12.427107
Event: Workshop on Nanostructure Science, Metrology, and Technology, 2001, Gaithersburg, MD, United States
Abstract
The promise and challenge of nanotechnology is immense. The National Nanotechnology Initiative provides an opportunity to develop a new technological base for U.S. Industry. Nanometrology is the basis of the new measurement methods that must be developed to support the nanotechnology. Nanometrology has played a key role in support for the semiconductor and other U.S. industries already developing products with nanometer-sized dimensions. Nanometrology techniques, standards and infrastructure development are needed to control fabrication and production, ensure product quality, and enable different parts to work effectively together. Size and tolerance are important considerations and require standardization. Metrology is critical to developing a complete understanding of any new phenomenon or process. Only those things that can be measured can be fully understood. Ultimately, this understanding is critical to obtaining the immense economic benefits predicted by the National Nanotechnology Initiative for U. S. industry.
© (2002) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Michael T. Postek, Michael T. Postek, } "The challenge of nanometrology", Proc. SPIE 4608, Nanostructure Science, Metrology, and Technology, (24 July 2002); doi: 10.1117/12.427107; https://doi.org/10.1117/12.427107
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