6 May 2002 Atomic fluorine source for chemical lasers
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Proceedings Volume 4631, Gas and Chemical Lasers and Intense Beam Applications III; (2002) https://doi.org/10.1117/12.465780
Event: High-Power Lasers and Applications, 2002, San Jose, California, United States
Abstract
We present results from the early development of an F atom source appropriate for HF and AGIL chemical laser research. The system uses high power microwaves to produce a high enthalpy plasma that thermally dissociates molecular species such as SF6 and F2. Results of the characterization of the flow are presented.
© (2002) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Steven J. Davis, David B. Oakes, Michael E. Read, Alan H. Gelb, "Atomic fluorine source for chemical lasers", Proc. SPIE 4631, Gas and Chemical Lasers and Intense Beam Applications III, (6 May 2002); doi: 10.1117/12.465780; https://doi.org/10.1117/12.465780
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