Translator Disclaimer
6 May 2002 Atomic fluorine source for chemical lasers
Author Affiliations +
Proceedings Volume 4631, Gas and Chemical Lasers and Intense Beam Applications III; (2002) https://doi.org/10.1117/12.465780
Event: High-Power Lasers and Applications, 2002, San Jose, California, United States
Abstract
We present results from the early development of an F atom source appropriate for HF and AGIL chemical laser research. The system uses high power microwaves to produce a high enthalpy plasma that thermally dissociates molecular species such as SF6 and F2. Results of the characterization of the flow are presented.
© (2002) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Steven J. Davis, David B. Oakes, Michael E. Read, and Alan H. Gelb "Atomic fluorine source for chemical lasers", Proc. SPIE 4631, Gas and Chemical Lasers and Intense Beam Applications III, (6 May 2002); https://doi.org/10.1117/12.465780
PROCEEDINGS
6 PAGES


SHARE
Advertisement
Advertisement
RELATED CONTENT

F titration in a HF laser pumped by a nonchain...
Proceedings of SPIE (December 21 1998)
An all gas phase iodine laser using molecular iodine as...
Proceedings of SPIE (November 15 2010)
Arc heater for thermal driven HF/DF chemical laser
Proceedings of SPIE (January 31 1991)
Advanced iodine lasers
Proceedings of SPIE (June 04 2003)

Back to Top