Paper
18 June 2002 Effect of laser parameters on the exposure and selective etch rate in photostructurable glass
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Abstract
Photostructurable glass-ceramic materials have received significant attention due to their utility in aerospace engineering and micro technology. For example, the ability to fabricate structures in glass is important in the design and integration of micro scale electronic, optical and fluidic devices. Direct-write pulsed UV laser processing techniques have been utilized recently to create patterned 3D microstructures in a lithium-aluminosilicate glass. The direct-write microfabrication process involves the formation of an initial latent image in the glass via UV laser radiation. Thermal-induced ceramization is utilized to develop the latent image into a permanent image. Material removal and microstructure fabrication are then accomplished by preferential isotropic etching of the developed regions.
© (2002) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Frank E. Livingston, William W. Hansen, Adam Huang, and Henry Helvajian "Effect of laser parameters on the exposure and selective etch rate in photostructurable glass", Proc. SPIE 4637, Photon Processing in Microelectronics and Photonics, (18 June 2002); https://doi.org/10.1117/12.470631
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CITATIONS
Cited by 20 scholarly publications and 1 patent.
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KEYWORDS
Etching

Glasses

Laser processing

Ultraviolet radiation

Microelectromechanical systems

Optical lithography

Pulsed laser operation

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