Generation of functional structures by laser pyrolysis of polysilazane

Hans-Joachim Krauss; Andreas Otto

doi:10.1117/12.470611

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18 June 2002 Generation of functional structures by laser pyrolysis of polysilazane

Proceedings Volume 4637, Photon Processing in Microelectronics and Photonics; (2002) https://doi.org/10.1117/12.470611
Event: High-Power Lasers and Applications, 2002, San Jose, California, United States

Abstract

The pyrolysis of polysilazanes by laser power represents an innovative technique for the generation of ceramic-like coatings and structures. The dissolved polysilazanes can be easily applied by painting techniques such as dipping or spraying. In the following pyrolysis the polysilazane layer transforms into an amorphous ceramic-like coating. The laser power is absorbed in the precursor layer, which leads to the latter's ceramization without damaging the substrate by thermal load. While plane laser pyrolysis creates a protective coating, selective pyrolysis creates a raised and adherent ceramic-like structure that remains after the unexposed polymer layer has been removed. The flexibility of a writing laser system in conjunction with a suitable handling system makes it possible to inscribe any kind of 2D structure on nearly any complexly shaped part. Some of the chemical, magnetic, and electrical structure properties can be adjusted by the pyrolysis parameters and special types of filler particles. Especially the possibility to control electric conductivity should make it possible to create structure dielectric films or planar resistors, inductors or capacitors, which are basically written on the surface of the part. Because of their ceramic nature of the structures are resistant against high temperatures and corrosive media. Thus, this new additive structuring technique could finally strike a new path in creating corrosion resistant high- temperature sensors and control systems.

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Hans-Joachim Krauss and Andreas Otto "Generation of functional structures by laser pyrolysis of polysilazane", Proc. SPIE 4637, Photon Processing in Microelectronics and Photonics, (18 June 2002); https://doi.org/10.1117/12.470611

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