18 June 2002 Glass micromachining using the VUV F2 laser
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Proceedings Volume 4637, Photon Processing in Microelectronics and Photonics; (2002) https://doi.org/10.1117/12.470626
Event: High-Power Lasers and Applications, 2002, San Jose, California, United States
Abstract
Theoretical and experimental studies of the surface quality in 157 nm F2 laser-ablated glasses are reported. Limitations set by statistical fluctuations in the multi- mode beam and by stationary beam non-uniformity are explored together with materials issues such as laser-induced surface cracking. Experimental work on ablating polymethyl methacrylate, used as a low threshold medium for recording of the VUV beam, and soda lime glass are described. Use is made of the probe beam deflection technique to determine ablation thresholds, and a variety of methods adopted for characterizing and assessing the quality of ablated surfaces e.g. scanning-electron microscopy, mechanical and optical interference profiling and atomic force microscopy. Preliminary roughness measurements are compared with theoretical expectations and the implication for glass micromachining with the F2 laser discussed.
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Peter E. Dyer, Saher M. Maswadi, Howard V. Snelling, Christopher D. Walton, "Glass micromachining using the VUV F2 laser", Proc. SPIE 4637, Photon Processing in Microelectronics and Photonics, (18 June 2002); doi: 10.1117/12.470626; https://doi.org/10.1117/12.470626
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