18 June 2002 Refractive index of nanostructured optical materials
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Proceedings Volume 4640, Integrated Optics: Devices, Materials, and Technologies VI; (2002) https://doi.org/10.1117/12.433211
Event: Symposium on Integrated Optoelectronic Devices, 2002, San Jose, California, United States
Thanks to progresses in photolithography techniques optical materials can now be structured to a scale of a few tens of a nanometer. This has opened a wide field of new applications. When concerned with a scale of some tens of a micron down to a few microns, microlens and integrated optic components can be made. When the material is structured with a scale in the order of the wavelength of light, different filtering functions can be made. This concerns Bragg mirrors or more generally Photonic Crystals. A structuration in a scale small in front of the wavelength is also of a great interest. In this case the material does not diffract the light anymore an dit behaves like a homogeneous one. The calculated transmittance of a laser mirror is used to determine the effective index of the single layer equivalent to the multilayer stack. The artificial anisotropy of thin films structured with a one-dimension sub wavelength grating made by holography is measured. The limitation of the first order homogenization theory is given for two different grating steps. Polarizing coatings or polarization rotators are designed to work in normal incidence by inserting anisotropic films in simple multilayer structures.
© (2002) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Francois Flory, Francois Flory, Ludovic Escoubas, Ludovic Escoubas, Emmanuel Drouard, Emmanuel Drouard, Basile Lazarides, Basile Lazarides, } "Refractive index of nanostructured optical materials", Proc. SPIE 4640, Integrated Optics: Devices, Materials, and Technologies VI, (18 June 2002); doi: 10.1117/12.433211; https://doi.org/10.1117/12.433211


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