VUV-UV multiwavelength excitation process using F2 and KrF excimer lasers

Koji Sugioka; Toshimitsu Akake; Kotaro Obata; Katsumi Midorikawa

doi:10.1117/12.464123

30 April 2002 VUV-UV multiwavelength excitation process using F₂ and KrF excimer lasers

Koji Sugioka, Toshimitsu Akake, Kotaro Obata, Katsumi Midorikawa

Proceedings Volume 4644, Seventh International Conference on Laser and Laser-Information Technologies; (2002) https://doi.org/10.1117/12.464123
Event: Seventh International Conference on Laser and Laser Information Technologies, 2001, Vladimir, Suzdal, Russian Federation

Abstract

VUV-UV multiwavelength excitation process for precision microfabrication of hard materials, in which simultaneous irradiation of the vacuum ultraviolet (VUV) laser beam with extremely small laser fluence and the ultraviolet (UV) laser beam leads to effective ablation, is reviewed. A collinear irradiation system of F₂ and KrF excimer lasers has been developed for this process. This system achieves well- defined micropatterning of fused silica and GaN with little thermal influence and little debris deposition. Ablation mechanism is explained as absorption of KrF excimer laser by excited-states formed by F₂ laser (excited-state absorption: ESA). In addition, this technique is applied for much more efficient refractive index modification of fused silica compared with single F₂ laser irradiation, which is attributed to resonance photoionization-like process based on ESA. These processes are characterized by experiments carried out at various conditions such as laser fluence, irradiation timing of each laser beam, and pulse number.

Citation Download Citation

Koji Sugioka, Toshimitsu Akake, Kotaro Obata, and Katsumi Midorikawa "VUV-UV multiwavelength excitation process using F₂ and KrF excimer lasers", Proc. SPIE 4644, Seventh International Conference on Laser and Laser-Information Technologies, (30 April 2002); https://doi.org/10.1117/12.464123

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