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7 June 2002 Wavelength division multiplexing with a self-focusing transmission grating
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Proceedings Volume 4653, WDM and Photonic Switching Devices for Network Applications III; (2002)
Event: Symposium on Integrated Optoelectronic Devices, 2002, San Jose, California, United States
An integrated optical wavelength division multiplexer/demultiplexer for the 1.5micrometers telecommunication band is presented using a self-focusing transmission grating as the main dispersive element. The high index contrast between the primary TiO2 and the secondary Al2O3 slab waveguide enables comparatively small devices. In contrast to most other WDM principles like arrayed waveguide gratings or interferometer based devices the optical path may be folded thereby further reducing system dimensions. Plasma assisted metal organic chemical vapor deposition is used to deposit Al2O3 and TiO2 thin films onto oxidized silicon substrates from aluminium acetylacetonate Al(acac) and a prototype precursor cyclopentadienyl-cycloheptatrienyl-titanium CpTiCh, respectively. The grating is realized by an anisotropic plasma etch process. Common input and output channels (respectively input channels and common output for a multiplexer) are numerical aperture matched ridge waveguides and can be coupled to optical fibers. In spite of positioning the outgoing waveguides according to the focal points of the self-focusing grating, the grating itself is designed to meet the layout of the device. The strong impact of the desired arrangement on the grating properties (curvature, size and far field) necessitates a compromise which is found by a hybrid simulation based on the finite element analysis (FEM) and a genetic algorithm.
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Stefan Wiechmann, Hans Joachim Heider, Matthias Mahnke, and Joerg Mueller "Wavelength division multiplexing with a self-focusing transmission grating", Proc. SPIE 4653, WDM and Photonic Switching Devices for Network Applications III, (7 June 2002);

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