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9 April 2002 Aperture scaling of 351-nm high-reflectivity sol-gel-based mirror coatings
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This paper discusses the development of sol-gel thin films at AWE with respect to the formation of high reflectivity optical coatings. The use of such mirrors allows the separation of 1053 nm [1ω], 527 nm [2ω] and 351 nm [3ω] light from high power Neodymium laser systems before entering a target chamber and focusing onto a plasma physics target. The coating technique to achieve successful mirrors is discussed along with the analysis of the multilayers. Issues of scaling up from 50-mm diameter components to the coating of 150-mm square optics are reported along with the simultaneous achievement of high reflectivity, uniformity, wavefront preservation and high laser induced damage thresholds (LIDT).
© (2002) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
James E. Andrew, Nicholas J. Bazin, Hazel A. McInnes, A. J. Morris, and K. J. Porter "Aperture scaling of 351-nm high-reflectivity sol-gel-based mirror coatings", Proc. SPIE 4679, Laser-Induced Damage in Optical Materials: 2001, (9 April 2002);

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