9 April 2002 Investigation of fluorescence microscopy as a tool for noninvasive detection and imaging of damage precursors at 351 nm
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Proceedings Volume 4679, Laser-Induced Damage in Optical Materials: 2001; (2002); doi: 10.1117/12.461715
Event: Boulder Damage, 2001, Boulder, CO, United States
Abstract
This work is an experimental investigation to evaluate the potential of fluorescence microscopy as a tool to detect surface contamination as well as reveal surface damage precursors on DKDP and SiO2 optics. To achieve these technical objectives, microscopic imaging systems were built that also incorporate in-situ damage testing capabilities. Fluorescence imaging experiments were performed using 351-nm laser excitation while damage testing was performed at relatively high laser fluences. The experimental results demonstrated the potential of this technique to address the aforementioned technical issues.
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Stavros G. Demos, Mike C. Nostrand, Michael C Staggs, Christopher W. Carr, Douglas E. Hahn, Mark R. Kozlowski, Lynn Matthew Sheehan, Colin L. Battersby, Alan K. Burnham, "Investigation of fluorescence microscopy as a tool for noninvasive detection and imaging of damage precursors at 351 nm", Proc. SPIE 4679, Laser-Induced Damage in Optical Materials: 2001, (9 April 2002); doi: 10.1117/12.461715; https://doi.org/10.1117/12.461715
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KEYWORDS
Luminescence

Light scattering

Microscopy

Crystals

Laser damage threshold

Surface finishing

Laser induced damage

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