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1 July 2002 Advanced deflector elements for high-throughput electron optical systems
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Abstract
We have successfully produced and outfitted in-lens deflector elements which can be used for off-axis aberration correction in high throughput electron optics. A thorough analysis of mechanical tolerances, the study of the effect of mechanical tolerances on the imaging performance, and the comparison of calculated and measured deflection fields indicate the capability of such deflector elements for reaching the demands of high throughput electron optical devices.
© (2002) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Oliver Kienzle, Rainer Knippelmeyer, Wilfried Claus, Marko Matijevic, Lars Ehrhardt, Wolf D. Rau, and Alexander Orchowski "Advanced deflector elements for high-throughput electron optical systems", Proc. SPIE 4688, Emerging Lithographic Technologies VI, (1 July 2002); https://doi.org/10.1117/12.472332
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