1 July 2002 At-wavelength inspection of defect smoothing in EUVL masks
Author Affiliations +
Abstract
Results of at-wavelength inspection of EUVL mask substrate defects that were smoothed by multilayer coatings are presented. Programmed mask substrate defects were made with 80nm gold (Au) spheres, which were deposited on the mask substrate before the Mo/Si reflective multilayer coating. After coating, at-wavelength and visible-light inspection were then performed. The smoothing process was found to be effective in significantly suppressing the EUV visibility of the defects.
© (2002) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Moonsuk Yi, Min-Cheol Park, Paul B. Mirkarimi, Cindy C. Larson, Jeffrey Bokor, "At-wavelength inspection of defect smoothing in EUVL masks", Proc. SPIE 4688, Emerging Lithographic Technologies VI, (1 July 2002); doi: 10.1117/12.472314; https://doi.org/10.1117/12.472314
PROCEEDINGS
6 PAGES


SHARE
Back to Top