1 July 2002 Design and fabrication of broadband EUV multilayer mirrors
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Abstract
Multilayer mirrors with a significantly increased bandwidth in spectral and angular reflectance have been designed and deposited with a commercial magnetron sputtering system. A non-periodic multilayer design based on the thickness optimization of each layer by a stochastic method is compared to a design which consists of 3 different stacks. The EUV reflection of the samples was investigated with synchrotron radiation at the reflectometer of the PTB (Physikalisch-Technische Bundesanstalt) at BESSY II in Berlin. A reflectivity of more than 15 percent was reached in the whole wavelength range from 13 nm to 15 nm and a reflectivity of more than 30 percent was obtained for incidence angles from 0 degrees to 20 degrees with both designs. The increase in bandwidth is unavoidably connected with a decrease of peak reflectivity. Therefore, the application of such mirrors involves areas where a maximum peak reflectivity is not required, e.g. in EUV spectroscopy and for the metrology for EUV sources. Furthermore, the use of such mirrors in combination with a broadband plasma source will result in a higher integral reflectivity.
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Thomas Kuhlmann, Sergey A. Yulin, Torsten Feigl, Norbert Kaiser, Helmut Bernitzki, Hans Lauth, "Design and fabrication of broadband EUV multilayer mirrors", Proc. SPIE 4688, Emerging Lithographic Technologies VI, (1 July 2002); doi: 10.1117/12.472327; https://doi.org/10.1117/12.472327
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