Behavior of chemically amplified resist defects in TMAH solution

Yuko Ono; Osamu Miyahara; Yukio Kiba; Junichi Kitano

doi:10.1117/12.473419

16 July 2002 Behavior of chemically amplified resist defects in TMAH solution

Yuko Ono, Osamu Miyahara, Yukio Kiba, Junichi Kitano

Proceedings Volume 4689, Metrology, Inspection, and Process Control for Microlithography XVI; (2002) https://doi.org/10.1117/12.473419
Event: SPIE's 27th Annual International Symposium on Microlithography, 2002, Santa Clara, California, United States

Abstract

As semiconductor design rules become increasingly complex, there is growing demand for a reduction in defects in lithography processes, and the process that contributes most to such defects is believed to be the developing process. The control of defects occurring in chemically amplified resist due to changes in the resist structure has been growing in complexity. Today, when the exposure source is about to undergo a transition from KrF (248 nm) to ArF (193 nm), the controlled objects in defect inspection decrease in size, becoming smaller than the particle size that can be handled by inspection machines. For defect control against the background of the increasing miniaturization anticipated in the future, it will be necessary to gain an understanding of the behavior of ultra micro defects contained in developers. This report concerns the consideration of defect behavior in developing fluid resulting from the quantification of defects occurring due to resist dissolution in the developing fluid, and from defect behavioral analysis performed on the developing fluid.

Citation Download Citation

Yuko Ono, Osamu Miyahara, Yukio Kiba, and Junichi Kitano "Behavior of chemically amplified resist defects in TMAH solution", Proc. SPIE 4689, Metrology, Inspection, and Process Control for Microlithography XVI, (16 July 2002); https://doi.org/10.1117/12.473419

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available