CD reference materials for sub-10th um applications

Michael W. Cresswell; E. Hal Bogardus; J.V. Martinez de Pinillos; Marylyn Hoy Bennett; Richard A. Allen; William F. Guthrie; Christine E. Murabito; Barbara A. am Ende; Loren W. Linholm

doi:10.1117/12.473450

16 July 2002 CD reference materials for sub-10th μm applications

Michael W. Cresswell, E. Hal Bogardus, J.V. Martinez de Pinillos, Marylyn Hoy Bennett, Richard A. Allen, William F. Guthrie, Christine E. Murabito, Barbara A. am Ende, Loren W. Linholm

Author Affiliations +

Proceedings Volume 4689, Metrology, Inspection, and Process Control for Microlithography XVI; (2002) https://doi.org/10.1117/12.473450
Event: SPIE's 27th Annual International Symposium on Microlithography, 2002, Santa Clara, California, United States

Abstract

Prototype linewidth reference materials with Critical Dimensions (CDs) as narrow as 70 nm have been patterned in silicon-on-insulator films. The sidewalls of the reference features are parallel, normal to the substrate surface, and have almost atomically smooth surfaces. Linewidth calibration begins with the measurement of the electrical CDs of multiple reference features located at a selection of die sites on a wafer. The absolute widths of the cross sections of a sub-set of reference features on several chips that are diced from the wafer are then subjected to high resolution transmission electron microscopy (HRTEM) imaging to determine their physical CDs by lattice-plane counting. Sample preparation for lattice-plane counting by HRTEM Is destructive, and other reference features on the same chip become unusable for reference-material purposes. However, a calibration curve for converting the measured electrical CDs of reference features on other chips on the wafer, known as 'product reference features', to their physical values is obtained. The uncertainty attributed to the physical CD values of the product reference features generally varies inversely with the linear correlation between the cross- section lattice-plane counts and the corresponding electrical CD measurements of the sub-set of reference features that were selected for HRTEM imaging. A linear correlation value of approximately 0.97 has been obtained from a sub-set of 12 HRTEM measurements. In this case, the uncertainty attributed to the physical CD values of the product reference features is believed to be responsible for most of the product reference feature uncertainty. However, it has now been found that a forming-gas annealing treatment appears to prevent the referenced time dependence and thus has the potential for reducing the uncertainty level.

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Michael W. Cresswell, E. Hal Bogardus, J.V. Martinez de Pinillos, Marylyn Hoy Bennett, Richard A. Allen, William F. Guthrie, Christine E. Murabito, Barbara A. am Ende, and Loren W. Linholm "CD reference materials for sub-10th μm applications", Proc. SPIE 4689, Metrology, Inspection, and Process Control for Microlithography XVI, (16 July 2002); https://doi.org/10.1117/12.473450

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