16 July 2002 Factors influencing CD-SEM metrology
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Abstract
Nanometrology LLC has developed a unique set of solutions for optimizing CD-SEM metrology by improving signal to noise ratio and quantifying scan non-linearity. Examples of Nanometrology's solutions for improved CD-SEM magnification calibration are demonstrated using CD-SEMs from a variety of user sites. To our knowledge, this is the first time that a method to quantify CD-SEM scan non-linearity with precision 0.1 percent has been reported. Calibration precision of 0.1 percent or better can be achieved on both cross-section and CD-SEMs to enable them to meet or exceed the requirements of the ITRS roadmap beyond 2014.
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Albert Sicignano, Arkady V. Nikitin, Dmitriy Y. Yeremin, Matthew Sandy, E. Tim Goldburt, "Factors influencing CD-SEM metrology", Proc. SPIE 4689, Metrology, Inspection, and Process Control for Microlithography XVI, (16 July 2002); doi: 10.1117/12.473447; https://doi.org/10.1117/12.473447
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KEYWORDS
Signal to noise ratio

Calibration

Metrology

Video

Convolution

Scanning electron microscopy

Digital imaging

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