Future of e-beam metrology: obstacles and opportunities

David C. Joy

doi:10.1117/12.473408

16 July 2002 Future of e-beam metrology: obstacles and opportunities

David C. Joy

Proceedings Volume 4689, Metrology, Inspection, and Process Control for Microlithography XVI; (2002) https://doi.org/10.1117/12.473408
Event: SPIE's 27th Annual International Symposium on Microlithography, 2002, Santa Clara, California, United States

Abstract

Electron-beam tools have been an important part of the semiconductor industry since its beginnings especially in the area of metrology and are a major contributor towards the goals of process control and yield enhancement. However, in order to stay on the Moore's Law curve instrument performance must be improved by a factor of two every two or three years and with the proximity of fundamental physical limits such major improvements in performance become increasingly difficult to obtain. This paper examines the opportunities that exist for continued improvement, and considers what other options are available for tools to replace the CD-SEM and its associates.

Citation Download Citation

David C. Joy "Future of e-beam metrology: obstacles and opportunities", Proc. SPIE 4689, Metrology, Inspection, and Process Control for Microlithography XVI, (16 July 2002); https://doi.org/10.1117/12.473408

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