16 July 2002 High-resolution photomask transmission and phase measurement tool
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Abstract
Acintic measurements of optical transmission are critical for determining the quality of repairs on advanced ArF- generation photomasks. We describe a new 193 nm tool designed to provide mask makers and uses the capability to resolve and measure photomask features with dimensions less than 0.20 micron. Measurements of transmission with sub-1 percent error are achieved in 30 seconds by using a laser probe beam imaged onto the top of the mask surface. We present high-resolution actinic images of embedded attenuator phase shift masks and of binary masks and discuss various methods and results of measuring mask transmission. A scheme to add phase retardation measurement capability to the tool is described, and preliminary results are discussed.
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Jim J. Jacob, Jim J. Jacob, Tim Litvin, Tim Litvin, Andrew J. Merriam, Andrew J. Merriam, "High-resolution photomask transmission and phase measurement tool", Proc. SPIE 4689, Metrology, Inspection, and Process Control for Microlithography XVI, (16 July 2002); doi: 10.1117/12.473409; https://doi.org/10.1117/12.473409
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