Matching and monitoring a CD-SEM tool cluster

Albert Sicignano; Arkady V. Nikitin; Dmitriy Y. Yeremin; Matthew Sandy; E. Tim Goldburt

doi:10.1117/12.473446

16 July 2002 Matching and monitoring a CD-SEM tool cluster

Albert Sicignano, Arkady V. Nikitin, Dmitriy Y. Yeremin, Matthew Sandy, E. Tim Goldburt

Proceedings Volume 4689, Metrology, Inspection, and Process Control for Microlithography XVI; (2002) https://doi.org/10.1117/12.473446
Event: SPIE's 27th Annual International Symposium on Microlithography, 2002, Santa Clara, California, United States

Abstract

Nanometrology's unique solution to CD-SEM magnification calibration and matching. This utilizes a novel magnification calibration reference material (MCRM) designed and fabricated on an 8 inch wafer. When used with the proprietary software, it allows one to calibrate and match individual CD-SEMs. CD-SEM behavior can now be quantified in terms of its parameters such as the average magnification in the field of view (FOV), magnification non-linearity and magnification stability. It is essential to quantify these parameters with a precision of 0.1 percent or better in order to meet requirements for sub-100nm metrology.

Citation Download Citation

Albert Sicignano, Arkady V. Nikitin, Dmitriy Y. Yeremin, Matthew Sandy, and E. Tim Goldburt "Matching and monitoring a CD-SEM tool cluster", Proc. SPIE 4689, Metrology, Inspection, and Process Control for Microlithography XVI, (16 July 2002); https://doi.org/10.1117/12.473446

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