Paper
16 July 2002 Microeconomics of advanced process window control for 50-nm gates
Kevin M. Monahan, Xuemei Chen, Georges Falessi, Craig Garvin, Matt Hankinson, Amir Lev, Ady Levy, Michael D. Slessor
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Abstract
Fundamentally, advanced process control enables accelerated design-rule reduction, but simple microeconomic models that directly link the effects of advanced process control to profitability are rare or non-existent. In this work, we derive these links using a simplified model for the rate of profit generated by the semiconductor manufacturing process. We use it to explain why and how microprocessor manufacturers strive to avoid commoditization by producing only the number of dies required to satisfy the time-varying demand in each performance segment. This strategy is realized using the tactic known as speed binning, the deliberate creation of an unnatural distribution of microprocessor performance that varies according to market demand. We show that the ability of APC to achieve these economic objectives may be limited by variability in the larger manufacturing context, including measurement delays and process window variation.
© (2002) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Kevin M. Monahan, Xuemei Chen, Georges Falessi, Craig Garvin, Matt Hankinson, Amir Lev, Ady Levy, and Michael D. Slessor "Microeconomics of advanced process window control for 50-nm gates", Proc. SPIE 4689, Metrology, Inspection, and Process Control for Microlithography XVI, (16 July 2002); https://doi.org/10.1117/12.473503
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KEYWORDS
Semiconducting wafers

Process control

Manufacturing

Critical dimension metrology

Information operations

Metrology

Process modeling

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