16 July 2002 Optimization of Eth method for DUV process inline monitor
Author Affiliations +
In this paper, we describe the optimization strategy for Eth (Dose to clear) method of DUV resist process control for 0.25um technology. Both experimental and simulation results will be presented to show the optical and developing behaviors of DUV resist in extreme low energy exposure condition. Based on these data we proposed an optimized method of Eth measurement. With this method, false alarm of DUV resist photo-speed and exposure out of control will be eliminated, cost of manpower for OOC troubleshooting will be saved.
© (2002) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Wenzhan Zhou, Hao Chen, Teng Hwee Ng, Hui Kow Lim, "Optimization of Eth method for DUV process inline monitor", Proc. SPIE 4689, Metrology, Inspection, and Process Control for Microlithography XVI, (16 July 2002); doi: 10.1117/12.473442; https://doi.org/10.1117/12.473442

Back to Top