Image Reversal Techniques With Standard Positive Photoresist

Mary L. Long; Jeff Newman

doi:10.1117/12.941793

21 May 1984 Image Reversal Techniques With Standard Positive Photoresist

Mary L. Long, Jeff Newman

Proceedings Volume 0469, Advances in Resist Technology I; (1984) https://doi.org/10.1117/12.941793
Event: 1984 Microlithography Conferences, 1984, Santa Clara, United States

Abstract

The basic reaction of positive photoresist involves the conversion of the dissolution inhibitor (diazoketone) to a dissolution enhancer (carboxylic acid). The novolac-type resin is basically unchanged, but its solubility is controlled by the presence of either the dissolution inhibitor or enhancer. It has been demonstrated that the dissolution enhancer can be thermally degraded, and, under the proper conditions, this degradation can lead to the reversal of the resist image. It is, of course, imperative to optimize the developer selectivity and to capitalize on the specific characteristics of common positive resists to define a production-oriented image reversal process.**

Citation Download Citation

Mary L. Long and Jeff Newman "Image Reversal Techniques With Standard Positive Photoresist", Proc. SPIE 0469, Advances in Resist Technology I, (21 May 1984); https://doi.org/10.1117/12.941793

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