24 July 2002 Cycloolefin/cyanoacrylate (COCA) copolymers for 193-nm and 157-nm lithography
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Abstract
The copolymerization reaction between methyl cyanoacrylate (MCA) and a variety of cycloolefins (CO) was investigated. Cycololefin/cyanoacrylate (COCA) copolymers were obtained in good yields and with lithographically interesting molecular weights for all cycoolefins studied. Anionic MCA homopolymerization could be largely suppressed using acetic acid. Based on NMR data, the copolymerization may tend to a 1:1 CO:MCA incorporation ratio but further work with better suppression of the anionic component is needed to confirm this. Lithographic tests on copolymers of appropriately substituted norbornenes and MCA showed semi-dense and isolated line performance down to 90 nm.
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Ralph R. Dammel, Ralph R. Dammel, Raj Sakamuri, Raj Sakamuri, Sang-Ho Lee, Sang-Ho Lee, Dalil Rahman, Dalil Rahman, Takanori Kudo, Takanori Kudo, Andrew R. Romano, Andrew R. Romano, Larry F. Rhodes, Larry F. Rhodes, John-Henry Lipian, John-Henry Lipian, Cheryl Hacker, Cheryl Hacker, Dennis A. Barnes, Dennis A. Barnes, } "Cycloolefin/cyanoacrylate (COCA) copolymers for 193-nm and 157-nm lithography", Proc. SPIE 4690, Advances in Resist Technology and Processing XIX, (24 July 2002); doi: 10.1117/12.474196; https://doi.org/10.1117/12.474196
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