Macrocycle monomer having ethyleneoxy unit to buffer acid diffusion (new base for photoresist)

Geunsu Lee; Keun-Kyu Kong; Jae Chang Jung; Ki-Soo Shin; Jae-Hyun Kang; Sang-Don Kim; Yong-Jun Choi; Se-Jin Choi; Deog-Bae Kim; Jae-Hyun Kim

doi:10.1117/12.474211

24 July 2002 Macrocycle monomer having ethyleneoxy unit to buffer acid diffusion (new base for photoresist)

Geunsu Lee, Keun-Kyu Kong, Jae Chang Jung, Ki-Soo Shin, Jae-Hyun Kang, Sang-Don Kim, Yong-Jun Choi, Se-Jin Choi, Deog-Bae Kim, Jae-Hyun Kim

Author Affiliations +

Proceedings Volume 4690, Advances in Resist Technology and Processing XIX; (2002) https://doi.org/10.1117/12.474211
Event: SPIE's 27th Annual International Symposium on Microlithography, 2002, Santa Clara, California, United States

Abstract

Crown ether derivatives are composed of multi-ethyleneoxy units and have an electron rich cavity that can accommodate a proton. We have broadly investigated the effect of lone pair electrons of accumulated oxygen. First, we studied whether these crown compounds can control acid diffusion or not. Second, we synthesized monomers containing cyclic multi-ethyleneoxy units and studied their effect in polymers. Finally, we compared them with amines. Crown either, 18-crown-6, has a proper cavity to capture a proton by hydrogen bonding and actually had enough basicity to control acid diffusion. These studies show that crown ether derivatives can replace amines as a bases to restrain acid diffusion.

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Geunsu Lee, Keun-Kyu Kong, Jae Chang Jung, Ki-Soo Shin, Jae-Hyun Kang, Sang-Don Kim, Yong-Jun Choi, Se-Jin Choi, Deog-Bae Kim, and Jae-Hyun Kim "Macrocycle monomer having ethyleneoxy unit to buffer acid diffusion (new base for photoresist)", Proc. SPIE 4690, Advances in Resist Technology and Processing XIX, (24 July 2002); https://doi.org/10.1117/12.474211

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KEYWORDS

Photoresist materials

Polymers

Diffusion

Line edge roughness

Contamination

Ions

Hydrogen

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