24 July 2002 Newly developed acrylic copolymers for ArF photoresist
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Abstract
We have developed novel acrylic copolymers for ArF photoresist which have more etching durability than usual. The excellent one of those copolymers in handling contains 8- or 9- methacryloyloxy-4-oxatricyclo[5.2.1.02,6]decan-3-one (OTDMA) and (gamma) ,(gamma) -dimethyl-(alpha) -methylene-(gamma) -butyrolac tone (DMMB). OTDMA is a new methacrylic ester monomer having a lactone unit with bridged structure. DMMB introduces a lactone structure to the main chain of acrylic copolymers. It was suggested that the solubility of monomers depends on the hindrance of their polar group, and the role of the hydrophilic monomers has been discussed from the standpoint of the position of their hydrophilic parts.
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Yoshihiro Kamon, Yoshihiro Kamon, Hikaru Momose, Hikaru Momose, Hideaki Kuwano, Hideaki Kuwano, Tadayuki Fujiwara, Tadayuki Fujiwara, Masaharu Fujimoto, Masaharu Fujimoto, "Newly developed acrylic copolymers for ArF photoresist", Proc. SPIE 4690, Advances in Resist Technology and Processing XIX, (24 July 2002); doi: 10.1117/12.474263; https://doi.org/10.1117/12.474263
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