24 July 2002 Spin coating and photolithography using liquid and supercritical carbon dioxide
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We discuss a new dry lithographic process using only carbon dioxide (CO2) as a solvent. Novel CO2 soluble photoresists were synthesized based on random copolymers of poly(1,1-dihydroperfluorooctyl)methacrylate 2-tetrahyrdopyranyl methacrylate. Photoresist spin casting, development, and stripping were all carried out in either liquid or supercritical CO2. We investigate such parameters as resist sensitivity, contrast, and resolution. The contrast of these resists has been evaluated using 248 nm exposures, and promising test images have been formed.
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Erik N. Hoggan, Erik N. Hoggan, Devin Flowers, Devin Flowers, Joseph M. DeSimone, Joseph M. DeSimone, Ruben G. Carbonell, Ruben G. Carbonell, } "Spin coating and photolithography using liquid and supercritical carbon dioxide", Proc. SPIE 4690, Advances in Resist Technology and Processing XIX, (24 July 2002); doi: 10.1117/12.474199; https://doi.org/10.1117/12.474199

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