30 July 2002 Advanced hybrid optical proximity correction system with OPC segment library and model-based correction module
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Abstract
Advanced hybrid optical proximity correction (OPC) system with OPC segment library and a model-based correction module has been found to be much promising for reducing the mask data processing time. Recycling the OPC segment library made of previous products for next derivative products with common design rule could reduce the OPC process time down to 11% at the sixth Application Specific Integrated Circuit product for the conventional hybrid OPC scheme. Then, under the circumstances that the block-level layout verification tool with the hybrid OPC tool and the lithography simulator is utilized by designers for avoiding the lithographic dangers in the early stage of design, the most effective library can be generated in this layout verification flow and used for the correction of the completed layout. Due to this scheme, the OPC process time could be decreased to 11-16% for 256-Mbit Dynamic Random Access Memory gate and metal layer.
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Toshiya Kotani, Toshiya Kotani, Sachiko Kobayashi, Sachiko Kobayashi, Hirotaka Ichikawa, Hirotaka Ichikawa, Satoshi Tanaka, Satoshi Tanaka, Susumu Watanabe, Susumu Watanabe, Soichi Inoue, Soichi Inoue, } "Advanced hybrid optical proximity correction system with OPC segment library and model-based correction module", Proc. SPIE 4691, Optical Microlithography XV, (30 July 2002); doi: 10.1117/12.474546; https://doi.org/10.1117/12.474546
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