Characterization of a projection lens using the extended Nijboer-Zernike approach

Peter Dirksen; Joseph J. M. Braat; Peter De Bisschop; Guido C.A.M. Janssen; Casper A. H. Juffermans; Alvina M. Williams

doi:10.1117/12.474523

30 July 2002 Characterization of a projection lens using the extended Nijboer-Zernike approach

Peter Dirksen; Joseph J. M. Braat; Peter De Bisschop; Guido C.A.M. Janssen; Casper A. H. Juffermans; Alvina M. Williams

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Proceedings Volume 4691, Optical Microlithography XV; (2002) https://doi.org/10.1117/12.474523
Event: SPIE's 27th Annual International Symposium on Microlithography, 2002, Santa Clara, California, United States

Abstract

In this paper we give the proof of principle of a new experimental method to determine the aberrations of an optical system in the field. The measurement is based on the observation of the intensity point spread function of the lens. To analyze and interpret the measurement, use is made of an analytical method, the so-called extended Nijboer-Zernike approach. The new method is applicable to lithographic projection lenses, but also to EUV mirror systems or microscopes such as the objective lens of an optical mask inspection tool. Phase retrieval is demonstrated both analytically and experimentally. Theory and experimental results are given.

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Peter Dirksen, Peter Dirksen, Joseph J. M. Braat, Joseph J. M. Braat, Peter De Bisschop, Peter De Bisschop, Guido C.A.M. Janssen, Guido C.A.M. Janssen, Casper A. H. Juffermans, Casper A. H. Juffermans, Alvina M. Williams, Alvina M. Williams, } "Characterization of a projection lens using the extended Nijboer-Zernike approach", Proc. SPIE 4691, Optical Microlithography XV, (30 July 2002); doi: 10.1117/12.474523; https://doi.org/10.1117/12.474523

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