30 July 2002 Contamination and degradation of 157-nm stepper optical components: field experience at International SEMATECH
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Abstract
Significant improvement in 157nm optical components lifetime is required for successful implementation of pilot and production scale 157nm lithography. To date, most of the 157nm optics lifetime data has been collected in controlled laboratory conditions by introducing predetermined concentrations of contaminants and monitoring degradation in terms of transmission loss. This publication compliments prior work by documenting field experience with the 157nm Exitech Microstepper currently in operation at International SEMATECH. Failure mechanisms of various optical components are presented and molecular contamination levels in purge gas, tool enclosure, and clean room are documented. Finally the impacts of contaminant deposition and degradation of components on imaging performance is discussed.
© (2002) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Jeff Meute, Jeff Meute, Georgia K. Rich, Georgia K. Rich, Stefan Hien, Stefan Hien, Kim R. Dean, Kim R. Dean, Carolyn Gondran, Carolyn Gondran, Julian S. Cashmore, Julian S. Cashmore, Dominic Ashworth, Dominic Ashworth, James E. Webb, James E. Webb, Lisa R. Rich, Lisa R. Rich, Paul G. Dewa, Paul G. Dewa, } "Contamination and degradation of 157-nm stepper optical components: field experience at International SEMATECH", Proc. SPIE 4691, Optical Microlithography XV, (30 July 2002); doi: 10.1117/12.474621; https://doi.org/10.1117/12.474621
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