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30 July 2002 Controlling CD variations in a massively parallel pattern generator
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Abstract
Micronic is developing a massively parallel pattern generation system based on a micro-mechanical spatial light modulator (SLM). The electro-mechanical and optical properties of the micromirrors in the SLM can vary from one to another and over time. Therefore the response of each mirror must be calibrated, with accuracy sufficient to maintain CD uniformity requirements. We present a practical method for performing this calibration which greatly improves the micromirror grayscale uniformity and reduces CD error contribution from the SLM to less than 2nm.
© (2002) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Jarek Z. Luberek, Allen M. Carroll, Torbjoern Sandstrom, and Andrzej Karawajczyk "Controlling CD variations in a massively parallel pattern generator", Proc. SPIE 4691, Optical Microlithography XV, (30 July 2002); https://doi.org/10.1117/12.474615
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