30 July 2002 Development of a 5-kHz ultra-line-narrowed F2 laser for dioptric projection systems
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The roadmap of semiconductor fabrication predicts that the semiconductor market will demand 65 nm node devices from 2004/2005. Therefore, an Ultra-Line-Narrowed F2 laser for dioptric projection systems is currently being developed under the ASET project of The F2 Laser Lithography Development Project. The target of this project is to achieve a F2 laser spectral bandwidth below 0.2 pm (FWHM) and an average power of 25 W at a repetition rate of 5 kHz. The energy stability (3-sigma) target is less than 10%. An Oscillator-Amplifier arrangement at 2 kHz was developed as a first step of an Ultra-Line-Narrowed F2 laser system. With this laser system, we did the basic study of the synchronization technology for line narrowing operation using two system arrangements: MOPA (Master Oscillator/Power Amplifier) and Injection Locking. Based on this experience we have developed the 5 kHz system. With the 5 kHz Line-Narrowed Injection Locking system, we have achieved a spectral bandwidth of < 0.2 pm with an output energy of > 5 mJ and an energy pulse to pulse stability of 10%. The feasibility of a 5 kHz Ultra-Line-Narrowed F2 Laser for Dioptric Projection Systems has been demonstrated.
© (2002) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Tatsuya Ariga, Tatsuya Ariga, Hidenori Watanabe, Hidenori Watanabe, Takahito Kumazaki, Takahito Kumazaki, Naoki Kitatochi, Naoki Kitatochi, Kotaro Sasano, Kotaro Sasano, Yoshifumi Ueno, Yoshifumi Ueno, Masayuki Konishi, Masayuki Konishi, Takashi Suganuma, Takashi Suganuma, Masaki Nakano, Masaki Nakano, Toshio Yamashita, Toshio Yamashita, Toshihiro Nishisaka, Toshihiro Nishisaka, Ryoichi Nohdomi, Ryoichi Nohdomi, Kazuaki Hotta, Kazuaki Hotta, Hakaru Mizoguchi, Hakaru Mizoguchi, Kiyoharu Nakao, Kiyoharu Nakao, "Development of a 5-kHz ultra-line-narrowed F2 laser for dioptric projection systems", Proc. SPIE 4691, Optical Microlithography XV, (30 July 2002); doi: 10.1117/12.474613; https://doi.org/10.1117/12.474613


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