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30 July 2002 Evaluation of OPC mask printing with a raster scan pattern generator
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Abstract
MEBESR 50 kV mask pattern generators use Raster GraybeamTM writing, providing an effective grid that is 32X finer than the print grid. The electron beam size and print pixel size are variable between 60 nm and 120 nm, allowing a tradeoff between resolution and write time. Raster scan printing optimizes throughput by transferring precisely the amount of data to the mask that is consistent with the chosen resolution. As with other raster output devices, mask write times are not affected by pattern complexity. This paper examines the theoretical performance of Raster Graybeam for model-based optical proximity correction (OPC) patterns and provides examples of mask patterning performance. A simulation tool is used to model the MEBES eXaraTM system writing strategy, which uses four writing passes, interstitial print grids, offset scans, and eight dose levels per pass. It is found that Raster Graybeam produces aerial image quality equivalent to the convolution of the input pattern data with a Gaussian point spread function. Resolution of 90 nm is achieved for equal lines and spaces, supporting subresolution assist features. Angled features are a particular strength of raster scan patterning, with feature quality and write time that are independent of feature orientation.
© (2002) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Thomas H. Newman, Jan M. Chabala, B.J. Marleau, Frederick Raymond III, Olivier Toublan, Mark A. Gesley, and Frank E. Abboud "Evaluation of OPC mask printing with a raster scan pattern generator", Proc. SPIE 4691, Optical Microlithography XV, (30 July 2002); https://doi.org/10.1117/12.474514
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