30 July 2002 Improvement of two-photon absorption lithography
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Abstract
Recently, a novel Resolution Enhancement Technology (RET) have been proposed to overcome the Rayleigh resolution limit by using both entangled photon pair and two-photon absorption resist. However, the illumination intensity is not enough to attain the reasonable throughput. We propose a new method which enables to enhance the resolution over the Rayleigh limit with more strong intensity source by using two-photon absorption resist, where the absorbed two photons have different polarization each other. Since it is recently reported that the stimulated emission of polarization-entangled photons has been achieved, we investigate the effect of such entangled four photons to the resolution enhancement instead of entangled photon pair. Moreover, we also study the application of two-mode squeezing state.
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Masato Shibuya, Masato Shibuya, Hiromi Ezaki, Hiromi Ezaki, } "Improvement of two-photon absorption lithography", Proc. SPIE 4691, Optical Microlithography XV, (30 July 2002); doi: 10.1117/12.474547; https://doi.org/10.1117/12.474547
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