Mask damage by electrostatic discharge: a reticle printability evaluation

Andrew Rudack; Lawrence Levit; Alvina M. Williams

doi:10.1117/12.474516

30 July 2002 Mask damage by electrostatic discharge: a reticle printability evaluation

Andrew Rudack, Lawrence Levit, Alvina M. Williams

Proceedings Volume 4691, Optical Microlithography XV; (2002) https://doi.org/10.1117/12.474516
Event: SPIE's 27th Annual International Symposium on Microlithography, 2002, Santa Clara, California, United States

Abstract

An evaluation of a Photolithography Mask damaged by Electrostatic Discharge (ESD) is presented, using pictures and data from the toolset at International SEMATECH's Advanced Technology Development Facility. The Photomask used in the printability evaluation is the Canary (DuPont TM) Reticle, demonstrating various degrees of ESD-induced damage to a repeating structure contained in the chrome-on-quartz pattern. Levels of damage to the chrome structures vary from non-existent, to barely detectable, to moderate, to catastrophic. The ESD-induced damage is then measured and compared through an assortment of Mask Metrology tools.

Citation Download Citation

Andrew Rudack, Lawrence Levit, and Alvina M. Williams "Mask damage by electrostatic discharge: a reticle printability evaluation", Proc. SPIE 4691, Optical Microlithography XV, (30 July 2002); https://doi.org/10.1117/12.474516

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