New-generation projection optics for ArF lithography

Yuji Chiba; Kazuhiro Takahashi

doi:10.1117/12.474616

30 July 2002 New-generation projection optics for ArF lithography

Yuji Chiba, Kazuhiro Takahashi

Proceedings Volume 4691, Optical Microlithography XV; (2002) https://doi.org/10.1117/12.474616
Event: SPIE's 27th Annual International Symposium on Microlithography, 2002, Santa Clara, California, United States

Abstract

We have developed an ArF scanner with 0.7NA, the FPA- 5000AS2, to meet the requirements of the semiconductor industry. The biggest improvement of this system from the previous model is its projection optics. The new projection lens design allows residual aberrations to be extremely small in order to satisfy the requirements of increasingly severe device production. Furthermore, the aberrations derived from the manufacturing process are minimized in the same manner as conventional i-line and KrF lenses by precisely measuring them with a phase measuring interferometer (PMI). To reduce manufacturing-induced aberrations, we calculate various components of imaging performance at each lens manufacturing process and feed them back to the tuning process. Focusing only on aberration in the expression of root mean square (RMS) can never be sufficient for optimal aberration reduction. Lens performance can be optimally improved by gaining a balance among Zernike terms, which represent aberrations, for critical dimensions of various device patterns. It helps us supply users with a projection lens having performance that meets their requirements. This paper reports on the imaging performance of the new lens for both static and dynamic exposure as well as simulation results using PMI data. It also presents the mechanical barrel system that holds the high performance projection lens, intrinsic birefringence (IBR) of CaF₂, and leading-edge ArF lens technologies such as chemical clean technology. And imaging performance of the newest 0.75 NAArF projection lens is demonstrated.

Citation Download Citation

Yuji Chiba and Kazuhiro Takahashi "New-generation projection optics for ArF lithography", Proc. SPIE 4691, Optical Microlithography XV, (30 July 2002); https://doi.org/10.1117/12.474616

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available