30 July 2002 Production-ready 4-kHz ArF laser for 193-nm lithography
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Semiconductor chip manufacturing is on the verge of a new production process node driving critical feature sizes below 100 nm. The next generation of 193 nm Argon Fluoride laser, the NanoLithTM 7000, has been developed in response to this recent technology development in the lithography industry. The NanoLithTM 7000, offering 20 Watts average output power at 4 kHz repetition rate, is designed to support the highest exposure tool scan speeds for maximum productivity and wafer throughput. Technology improvements to support the move from pilot production to full production will be described. With core technology defined and performance to specification established, attention turns to cost of operation, which is closely tied to module lifetime and reliability. Here we present results of the NanoLithTM 7000 system lifetest tracking all optical performance data over a 4.4 Billion shot. The system is operated in firing modes ranging from 1-4 kHz, and up to 75% duty cycle. Overall system performance measured to date both in the lab and in the field suggests that this laser meets all the production requirements for 193 nm lithography.
© (2002) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Choonghoon Oh, Choonghoon Oh, Vladimir B. Fleurov, Vladimir B. Fleurov, Thomas Hofmann, Thomas Hofmann, Thomas P. Duffey, Thomas P. Duffey, F. Trintchouk, F. Trintchouk, Patrick O'Keeffe, Patrick O'Keeffe, Peter C. Newman, Peter C. Newman, Gerry M. Blumenstock, Gerry M. Blumenstock, } "Production-ready 4-kHz ArF laser for 193-nm lithography", Proc. SPIE 4691, Optical Microlithography XV, (30 July 2002); doi: 10.1117/12.474567; https://doi.org/10.1117/12.474567


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