30 July 2002 Progress of Nikon's F2-exposure tool development
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Proceedings Volume 4691, Optical Microlithography XV; (2002); doi: 10.1117/12.474607
Event: SPIE's 27th Annual International Symposium on Microlithography, 2002, Santa Clara, California, United States
Abstract
Progress of Nikon's F2 tool development is described. Intrinsic birefringence of CaF2 reported in the middle of last year by NIST had large impact on F2 optics designing. However, we believe Nikon has already overcome it, and the imaging performance of our newest design is almost the same level to the performance without the intrinsic birefringence. Several methods to correct the intrinsic birefringence are discussed in this paper. Evaluation software for the intrinsic birefringence is also developed, and simulated performances of the newest optical designs, which correct for the intrinsic birefringence, are shown. Among them, simulated CD uniformity of 35nm width gate is a good measure to evaluate the optical design performance. We have also made a steady progress on gas purging. Purging of 02 and H20 concentration less than O.lppm and lppm respectively has been attained.
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Naomasa Shiraishi, Soichi Owa, Yasuhiro Ohmura, Takashi Aoki, Yukako Matsumoto, Jin Nishikawa, Issei Tanaka, "Progress of Nikon's F2-exposure tool development", Proc. SPIE 4691, Optical Microlithography XV, (30 July 2002); doi: 10.1117/12.474607; https://doi.org/10.1117/12.474607
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KEYWORDS
Birefringence

Crystals

Projection systems

Optical design

Wavefronts

Lithography

Absorption

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