Reduction of reflective notching through illumination optimization

James C. Word; Dyiann Chou; Yiming Gu; John L. Sturtevant

doi:10.1117/12.474566

30 July 2002 Reduction of reflective notching through illumination optimization

James C. Word, Dyiann Chou, Yiming Gu, John L. Sturtevant

Proceedings Volume 4691, Optical Microlithography XV; (2002) https://doi.org/10.1117/12.474566
Event: SPIE's 27th Annual International Symposium on Microlithography, 2002, Santa Clara, California, United States

Abstract

Photolithography on reflective surfaces with topography can cause exposure in unwanted areas, resulting in the phenomenon of reflective notching. Solutions to this problem are known within the industry, including the use of bottom anti-reflective coatings (ARCs) and dyed photoresist. In certain situations, such as on implant layers, the use of a BARC may be impractical. One potential solution to this problem lies in optimization of the illumination settings. It is known that changes in the illumination settings NA and sigma have an impact on the swing curve amplitude. It will be shown that for certain situations, reflective notching can be virtually eliminated through proper selection of the illumination settings.

Citation Download Citation

James C. Word, Dyiann Chou, Yiming Gu, and John L. Sturtevant "Reduction of reflective notching through illumination optimization", Proc. SPIE 4691, Optical Microlithography XV, (30 July 2002); https://doi.org/10.1117/12.474566

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