30 July 2002 System qualification and optimization for imaging performance on the 0.80-NA 248-nm step-and-scan systems
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Abstract
This paper shows the improvements in imaging performance on the ASML PAS5500/800TM, the PAS5500/850BTM and the TWINSCANTM AT:850BTM Step & Scan systems. During setup, the lens aberrations are measured by the TAMIS technique and optimized. This gives excellent imaging performance for aberration sensitive features such as 'two bar,' the DRAM isolation pattern and isolated lines printed with alternating PSM. Lithographic tests based on these features were developed and tested on a number of 800 and 850 systems and gave results well within specification limits. Consequently, the imaging performance has been improved for a wide range of applications.
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Koen van Ingen Schenau, Koen van Ingen Schenau, Hans Bakker, Hans Bakker, Mark Zellenrath, Mark Zellenrath, Richard Moerman, Richard Moerman, Jeroen Linders, Jeroen Linders, Thomas Rohe, Thomas Rohe, Wolfgang Emer, Wolfgang Emer, } "System qualification and optimization for imaging performance on the 0.80-NA 248-nm step-and-scan systems", Proc. SPIE 4691, Optical Microlithography XV, (30 July 2002); doi: 10.1117/12.474612; https://doi.org/10.1117/12.474612
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