CONFERENCE PROCEEDINGS
Advanced Search >
Home > Proceedings > Volume 4692 > Article
12 July 2002 Development of a sub-100nm integrated imaging system using chromeless phase-shifting imaging with very high NA KrF exposure and off-axis illumination
John S. Petersen; Will Conley; Bernard J. Roman; Lloyd C. Litt; Kevin Lucas; Wei Wu; Douglas J. Van Den Broeke; J. Fung Chen; Thomas L. Laidig; Kurt E. Wampler; David J. Gerold; Mark John Maslow; Robert John Socha; Judith van Praagh; Richard Droste
Author Affiliations +
Proceedings Volume 4692, Design, Process Integration, and Characterization for Microelectronics; (2002) https://doi.org/10.1117/12.475692
Event: Design, Process Integration, and Characterization for Microelectronics, 2002, Santa Clara, CA, United States
Abstract
Examining features of varying pitch imaged using phase- shifting masks shows a pitch dependence eon the transmission best suited for optimum imaging. The reason for this deals with the relative magnitude of the zero and higher diffraction orders that are formed as the exposing wavelength passes through the plurality of zero and higher diffraction orders that are formed as the exposing wavelength passes through the plurality of zero and 180- degree phase-shifted regions. Subsequently, some of the diffraction orders are collected and projected to form the image of the object. chromeless Phase-Shift Lithography (CPL) deals with using half-toning structures to manipulate these relative magnitudes of these diffraction orders to ultimately construct the desired projected image. A key feature of CPL is that with the ability to manipulate the diffraction orders, a single weak phase-shifting mask can be made to emulate any weak phase-shifting mask and therefore the optimal imaging condition of any pattern can be placed on a single mask regardless of the type of weak phase- shifter that produces that result. In addition, these structures are used to render the plurality of size, shape and pitch such that the formed images produce their respective desired size and shape with sufficient image process tolerance. These images are typically made under identical exposure conditions, but not limited to single exposure condition. These half toning structures can be used exterior, as assist features, or interior to the primary feature. These structures can range in transmission from 0 percent to 100 percent and they can be phase-shifted relative to the primary features or not. Thus CPL deals with the design, layout, and utilization of transparent and semi- transparent phase-shift masks and their use in an integrated imaging solution of exposure tool, mask and the photoresist recording media. This paper describes the method of diffraction matching, provides an example and reviews some experimental data using high numerical aperture KrF exposure.
© (2002) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Citation Download Citation
John S. Petersen, John S. Petersen, Will Conley, Will Conley, Bernard J. Roman, Bernard J. Roman, Lloyd C. Litt, Lloyd C. Litt, Kevin Lucas, Kevin Lucas, Wei Wu, Wei Wu, Douglas J. Van Den Broeke, Douglas J. Van Den Broeke, J. Fung Chen, J. Fung Chen, Thomas L. Laidig, Thomas L. Laidig, Kurt E. Wampler, Kurt E. Wampler, David J. Gerold, David J. Gerold, Mark John Maslow, Mark John Maslow, Robert John Socha, Robert John Socha, Judith van Praagh, Judith van Praagh, Richard Droste, Richard Droste, } "Development of a sub-100nm integrated imaging system using chromeless phase-shifting imaging with very high NA KrF exposure and off-axis illumination", Proc. SPIE 4692, Design, Process Integration, and Characterization for Microelectronics, (12 July 2002); doi: 10.1117/12.475692; https://doi.org/10.1117/12.475692
ACCESS THE FULL ARTICLE
PERSONAL SIGN IN
Full access may be available with your subscription
 
Forgot your username?
Forgot your password?
No SPIE account? Create an account
or Institutional Sign In via Shibboleth
PURCHASE THIS CONTENT
SUBSCRIBE TO DIGITAL LIBRARY
50 downloads per 1-year subscription
Members: $195
Non-members: $335 ADD TO CART
25 downloads per 1 - year subscription
Members: $145
Non-members: $250 ADD TO CART
PURCHASE SINGLE ARTICLE
Includes PDF, HTML & Video, when available
Members: $14.40
Non-members: $18.00 ADD TO CART
PROCEEDINGS
 14 PAGES
DOWNLOAD PDF + SAVE TO MY LIBRARY
SHARE
GET CITATION
KEYWORDS
RELATED CONTENT
Subscribe to Digital Library
Receive Erratum Email Alert
Back to Top