Paper
12 July 2002 Model-based WYSIWYG: dimensional metrology infrastructure for design and integration
Author Affiliations +
Abstract
The purpose of this paper is to name and discuss some of the most basic issues in today's optical microlithography and to promote consensuses building, helping with the emergence of a superior model-based WYSIWYG patterning paradigm.
© (2002) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Alexander Starikov "Model-based WYSIWYG: dimensional metrology infrastructure for design and integration", Proc. SPIE 4692, Design, Process Integration, and Characterization for Microelectronics, (12 July 2002); https://doi.org/10.1117/12.475668
Lens.org Logo
CITATIONS
Cited by 3 scholarly publications.
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Optical lithography

Metrology

Model-based design

Dimensional metrology

Critical dimension metrology

Manufacturing

Overlay metrology

RELATED CONTENT


Back to Top