29 June 1984 An Improved Alignment System For Wafer Steppers
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Abstract
A diffraction grating alignment system has been demonstrated on a GCA stepper. Registration of better than 0.2 microns, 3 sigma has been achieved on NMOS production wafers.
© (1984) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
W R. Trutna, W R. Trutna, Mung Chen, Mung Chen, "An Improved Alignment System For Wafer Steppers", Proc. SPIE 0470, Optical Microlithography III: Technology for the Next Decade, (29 June 1984); doi: 10.1117/12.941888; https://doi.org/10.1117/12.941888
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