26 March 2002 Electrodischarge VUV radiator of low pressure on the mixtures He(Ar, Kr, Xe)/H2O
Author Affiliations +
Proceedings Volume 4747, International Conference on Atomic and Molecular Pulsed Lasers IV; (2002); doi: 10.1117/12.460153
Event: International Conference on Atomic and Molecular Pulsed Lasers IV, 2001, Tomsk, Russian Federation
Abstract
The results of development and optimization of the working medium of ecological pure radiator working in the range of 130 - 190 nm are presented in this paper. A decaying discharge of a constant current in the quartz or sapphire tube with an interelectrode distance of 50 mm was used for pumping. As working media the mixtures He(Ar, Kr, Xe)/H2O were used. It was shown that by falling the pressure on discharge interval Uch equals 800 - 1700 V, in discharge current Ich equals 5 - 50 mA and partial pressure of water vapor P(H2O)
© (2002) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Alexandr K. Shuaibov, Ludwig L. Shimon, Arkadij Dashchenko, Igor Shevera, "Electrodischarge VUV radiator of low pressure on the mixtures He(Ar, Kr, Xe)/H2O", Proc. SPIE 4747, International Conference on Atomic and Molecular Pulsed Lasers IV, (26 March 2002); doi: 10.1117/12.460153; https://doi.org/10.1117/12.460153
PROCEEDINGS
8 PAGES


SHARE
KEYWORDS
Plasma

Krypton

Helium

Vacuum ultraviolet

Molecules

Lamps

Protactinium

Back to Top