1 August 2002 157-nm lithography program at International SEMATECH
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Proceedings Volume 4754, Photomask and Next-Generation Lithography Mask Technology IX; (2002) https://doi.org/10.1117/12.476999
Event: Photomask and Next Generation Lithography Mask Technology IX, 2002, Yokohama, Japan
International SEMATECH has been a focal point for the 157nm effort worldwide. Since beginning the program in 1998, ISMT has provided forums for information dissemination ona semi- annual basis. The ability to develop a consensus to identify the most pressing critical issues has permitted the industry to develop this technology more rapidly than any other has been developed. There are still many issues that remain, but even the unexpected have been addressed and solutions put in place. There is a lesson to be learned that a concerted effort involving the entire industry can provide solutions to even the most difficult problems. The development is not completed, but the end is in sight. 157 nm lithography will be developed faster than any other technology due to the entire industry working in concert.
© (2002) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Giang T. Dao, Anthony Yen, and Walter J. Trybula "157-nm lithography program at International SEMATECH", Proc. SPIE 4754, Photomask and Next-Generation Lithography Mask Technology IX, (1 August 2002); doi: 10.1117/12.476999; https://doi.org/10.1117/12.476999


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