1 August 2002 Advanced data preparation and design automation
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Proceedings Volume 4754, Photomask and Next-Generation Lithography Mask Technology IX; (2002) https://doi.org/10.1117/12.476929
Event: Photomask and Next Generation Lithography Mask Technology IX, 2002, Yokohama, Japan
As new resolution enhancement techniques (RETs) are adopted to progress beyond 100 nm, the costs and benefits to the overall system of data handling must be viewed as an overall system. A 'state' approach to viewing flows has been very useful for determining insertion points for several RETs. Data preparation is a necessary part of the transformation from layout to mask. The data manipulations of required for RET also fall in this space between layout and mask. When separate point tools are used to carry out these different manipulations, increasingly large amounts of time are required to simply move data from one point tool to the other. As data file sizes increase as expected over the next decade, this problem will increase by orders of magnitude. None of this time is providing any additional productivity for data preparation. The result has been pressure to provide an integrated solution, in which OPC, phase assignment, and data preparation all share a single database. This delays flattening the data until the last necessary moment, presumably in the mask writer itself.
© (2002) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Franklin M. Schellenberg, Franklin M. Schellenberg, } "Advanced data preparation and design automation", Proc. SPIE 4754, Photomask and Next-Generation Lithography Mask Technology IX, (1 August 2002); doi: 10.1117/12.476929; https://doi.org/10.1117/12.476929

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