1 August 2002 Distributed hierarchical processing
Author Affiliations +
Proceedings Volume 4754, Photomask and Next-Generation Lithography Mask Technology IX; (2002) https://doi.org/10.1117/12.476932
Event: Photomask and Next Generation Lithography Mask Technology IX, 2002, Yokohama, Japan
Abstract
In previous papers, [BACUS 2000 4186-13 and BACUS 2001 4562-20], developments in hierarchical fracturing and in distributed processing in the CATSTM tool were studied. This study investigates the advances in the CATSTM tool that combine hierarchical fracturing and distributed processing. Time-consuming processes such as PSM, OPC and de-slivering logic for shaped beam machines are addressed. The attendant hierarchical fracturing commands are reviewed and commands associated with distributed processing are introduced. Hierarchical and flat data fracture times are compared, as well as threaded fracture and distributed fracture times. The resulting benefits are tabulated.
© (2002) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Paul DePesa, Danny Keogan, "Distributed hierarchical processing", Proc. SPIE 4754, Photomask and Next-Generation Lithography Mask Technology IX, (1 August 2002); doi: 10.1117/12.476932; https://doi.org/10.1117/12.476932
PROCEEDINGS
6 PAGES


SHARE
RELATED CONTENT


Back to Top