1 August 2002 Impact of deformation of the edges of two complementary patterns on electron-beam projection lithography mask making
Author Affiliations +
Proceedings Volume 4754, Photomask and Next-Generation Lithography Mask Technology IX; (2002); doi: 10.1117/12.476995
Event: Photomask and Next Generation Lithography Mask Technology IX, 2002, Yokohama, Japan
Abstract
In EPL, one of the issues is how to reduce the critical dimension (CD) error observed at the boundary of two complementary patterns when being stitched together to form one smooth line. This paper is concerned about edge deformation of the two lines to reduce the CD error. Among several forms, a pair of concave- and convex-three-up-step edges was formed for 580-nm-wide lines with 75-nm-wide steps. Our choices of the shapes of deformed edges are presented based on the degree of difficulties of making fiber features on mask. The first choice is a pair of concave- and convex-one-step edges. Two EPL dat conversion systems, SX-GIGA/EPLON of Seiko Instruments Inc. and PATACON-6600 of Nippon Control System Corp., are introduced. They are found to automatically yield required stitching correction patterns. Their flexibility in stitching correction enough to cope with customers' requests makes them useful and practical.
© (2002) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Hisatake Sano, Kenichi Morimoto, Yuuki Aritsuka, Hiroshi Fujita, "Impact of deformation of the edges of two complementary patterns on electron-beam projection lithography mask making", Proc. SPIE 4754, Photomask and Next-Generation Lithography Mask Technology IX, (1 August 2002); doi: 10.1117/12.476995; https://doi.org/10.1117/12.476995
PROCEEDINGS
6 PAGES


SHARE
KEYWORDS
Critical dimension metrology

Photomasks

Mask making

Data conversion

Projection lithography

Silicon

Control systems

RELATED CONTENT

Stencil pattern accuracy of EPL masks
Proceedings of SPIE (June 28 2005)
Advanced CD control technologies for EB mask writer
Proceedings of SPIE (December 06 2004)
Reduction of image placement errors in EPL masks
Proceedings of SPIE (June 16 2003)
On the way to 1 Gb demonstration of e...
Proceedings of SPIE (February 12 1997)

Back to Top