1 August 2002 Improvement of critical dimension stability of chemically amplified resist by overcoat
Author Affiliations +
Proceedings Volume 4754, Photomask and Next-Generation Lithography Mask Technology IX; (2002) https://doi.org/10.1117/12.476955
Event: Photomask and Next Generation Lithography Mask Technology IX, 2002, Yokohama, Japan
Abstract
The critical dimensions (CD) change by the process delay is the most critical issue to use the chemically amplified resists (CAR) for photomask fabrication. In the photo-mask fabrication processes, the resist should have both post coating delay (PCD) and post exposure delay (PED) stability, while keeping higher sensitivity. To achieve this requirement, overcoat process has been examined for the purpose of CD stabilization in CAR process for photomask manufacture. The material, which consists of hydrophobic polymer and photo acid generator (PAG), was used for the overcoat in this study. It has been proved that the overcoat shows the effect of controlling CD change, and applying the overcoat does not generate a fatal number of defects and pinholes. From these results, it is thought that the overcoat process is promising for the size stabilization in photomask manufacture for 100 nm devices.
© (2002) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Teruhiko Kumada, Teruhiko Kumada, Atsuko Sasahara, Atsuko Sasahara, Kazuyuki Maetoko, Kazuyuki Maetoko, Kunihiro Hosono, Kunihiro Hosono, Takemichi Honma, Takemichi Honma, Yuji Kodaira, Yuji Kodaira, Yukio Nakashiba, Yukio Nakashiba, Masaoshi Tsuzuki, Masaoshi Tsuzuki, Yasutaka Kikuchi, Yasutaka Kikuchi, } "Improvement of critical dimension stability of chemically amplified resist by overcoat", Proc. SPIE 4754, Photomask and Next-Generation Lithography Mask Technology IX, (1 August 2002); doi: 10.1117/12.476955; https://doi.org/10.1117/12.476955
PROCEEDINGS
8 PAGES


SHARE
Back to Top