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1 August 2002 Method for generating complementary mask data for an EPL stencil mask using a commercial pattern operation tool
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Proceedings Volume 4754, Photomask and Next-Generation Lithography Mask Technology IX; (2002) https://doi.org/10.1117/12.476994
Event: Photomask and Next Generation Lithography Mask Technology IX, 2002, Yokohama, Japan
Abstract
Electron-beam projection lithography (EPL) using stencil mask is one of the most promising candidates for next- generation lithography. However, the practical use of a stencil mask for fabricating ULSIs needs proximity effect correction (PEC) as well as complementary data to be prepared in order to solve the 'doughnut pattern problem'. We have developed a method for generating complementary data by using a pattern operation tool for design-rule checking and phase-shift-mask generation. The advantages of using these commercial DA tools war high processing speed as a result of maintenance of a hierarchical data structure, high reliability, and flexibility to allow the generation rules to be changed. Since beam blue, which varies according to pattern density in a sub-field, has to be estimated in PEC, sub-field division has to be performed prior to PEC. In the developed method, sub-field division is performed after the complementary-data generation. Sub-field division makes the chip dat almost flatten and enlarge the output data volume. If the sub-field division is performed prior to complementary decomposition, complementary-data generation cannot take advantage of high-speed processing resulting from the maintenance of a hierarchical data structure. We applied this method for metal layer dat of a 14 X 14-mm test chip that includes 300 million figures in flat form. For the complementary-data generation by the developed method CPU time was about 20 minutes using a 500-MHz PC with a 256-Mbyte memory. Maintenance of the hierarchical data structure made the volume of output GDSII data compact. The method can equalize the aperture densities of two complementary mask in a Coulomb-interaction range that is smaller than a sub-field. Although sub-field division using a DRC tool expands the output data volume in GDSII format, sub-field division using EB pattern data generator reduces output data in realistic size.
© (2002) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Akemi Moniwa and Fumio Murai "Method for generating complementary mask data for an EPL stencil mask using a commercial pattern operation tool", Proc. SPIE 4754, Photomask and Next-Generation Lithography Mask Technology IX, (1 August 2002); https://doi.org/10.1117/12.476994
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